CVD & PECVD

Across International CVD/PECVD Horizontal Tube Furnaces come in 1-zone and 2-zone options for heating to 1,700C. Key features of this product line include stainless steel vacuum flanges, the highest-grade alumina ceramics, and digital gas mixing for up to 6 channels. These furnaces are an efficient and affordable method for depositing thin films from a gas/ vapor state to a solid substrate. Popular sectors include nanomaterial and semiconductor, where metallic foils and graphene are grown, and wafers can be coated. 

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

Across International CVD/PECVD Horizontal Tube Furnaces come in 1-zone and 2-zone options for heating to 1,700C. Key features of this product line include stainless steel vacuum flanges, the highest-grade alumina ceramics, and digital gas mixing for up to 6 channels. These furnaces are an efficient and affordable method for depositing thin films from a gas/ vapor state to a solid substrate. Popular sectors include nanomaterial and semiconductor, where metallic foils and graphene are grown, and wafers can be coated. 

Plasma-enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a plasma of the reacting gases. The plasma is generally created by RF (AC) frequency or DC discharge between two electrodes, the space between which is filled with the reacting gases.

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