Solvent removal (for substitution) after HPLC, LC/MS, GC/MS
Sample concentration after preparative fraction
Solvent removal after NMR measurement
Concentration after solid phase extraction
Concentration of natural product extract, radioisotope labeled compounds and surfactant solutions
Pretreatment for multiple samples in drug and photosynthetic pigment analysis
Gas purging minimizes the effects of oxygen and moisture (humidity), reducing the risk of sample degradation. It also stabilizes the evaporation of hygroscopic solvents such as DMSO and water, making the process less sensitive to environmental conditions.
Solvent removal (for substitution) after HPLC, LC/MS, GC/MS
Sample concentration after preparative fraction
Solvent removal after NMR measurement
Concentration after solid phase extraction
Concentration of natural product extract, radioisotope labeled compounds and surfactant solutions
Pretreatment for multiple samples in drug and photosynthetic pigment analysis
Gas purging minimizes the effects of oxygen and moisture (humidity), reducing the risk of sample degradation. It also stabilizes the evaporation of hygroscopic solvents such as DMSO and water, making the process less sensitive to environmental conditions.
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